JPS5893872A - スパツタリング装置 - Google Patents

スパツタリング装置

Info

Publication number
JPS5893872A
JPS5893872A JP19236081A JP19236081A JPS5893872A JP S5893872 A JPS5893872 A JP S5893872A JP 19236081 A JP19236081 A JP 19236081A JP 19236081 A JP19236081 A JP 19236081A JP S5893872 A JPS5893872 A JP S5893872A
Authority
JP
Japan
Prior art keywords
target
covers
magnetic pole
blocks
magnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19236081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6127465B2 (en]
Inventor
Hidefumi Funaki
船木　秀文
Takehiro Sakurai
桜井　武広
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP19236081A priority Critical patent/JPS5893872A/ja
Priority to GB08231830A priority patent/GB2110719B/en
Priority to FR8219696A priority patent/FR2517330B1/fr
Priority to DE19823244691 priority patent/DE3244691C3/de
Publication of JPS5893872A publication Critical patent/JPS5893872A/ja
Publication of JPS6127465B2 publication Critical patent/JPS6127465B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3497—Temperature of target

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thin Magnetic Films (AREA)
JP19236081A 1981-11-30 1981-11-30 スパツタリング装置 Granted JPS5893872A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP19236081A JPS5893872A (ja) 1981-11-30 1981-11-30 スパツタリング装置
GB08231830A GB2110719B (en) 1981-11-30 1982-11-08 Sputtering apparatus
FR8219696A FR2517330B1 (fr) 1981-11-30 1982-11-24 Appareil de projection de metal sur un substrat, en particulier du type a magnetron
DE19823244691 DE3244691C3 (de) 1981-11-30 1982-11-30 Magnetron-Kathodenzerstäubungs-Anlage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19236081A JPS5893872A (ja) 1981-11-30 1981-11-30 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS5893872A true JPS5893872A (ja) 1983-06-03
JPS6127465B2 JPS6127465B2 (en]) 1986-06-25

Family

ID=16289978

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19236081A Granted JPS5893872A (ja) 1981-11-30 1981-11-30 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS5893872A (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60138070A (ja) * 1983-12-05 1985-07-22 ライボルト・アクチェンゲゼルシャフト 強磁性ターゲツトをスパツタするためのマグネトロンカソード
JPS6274074A (ja) * 1985-09-27 1987-04-04 Shimadzu Corp スパツタ用タ−ゲツトアセンブリ

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06311690A (ja) * 1993-04-19 1994-11-04 Toyo Electric Mfg Co Ltd 回転電機のハウジング冷却装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57158381A (en) * 1981-03-27 1982-09-30 Nippon Sheet Glass Co Ltd Magnetron sputtering device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57158381A (en) * 1981-03-27 1982-09-30 Nippon Sheet Glass Co Ltd Magnetron sputtering device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60138070A (ja) * 1983-12-05 1985-07-22 ライボルト・アクチェンゲゼルシャフト 強磁性ターゲツトをスパツタするためのマグネトロンカソード
JPS6274074A (ja) * 1985-09-27 1987-04-04 Shimadzu Corp スパツタ用タ−ゲツトアセンブリ

Also Published As

Publication number Publication date
JPS6127465B2 (en]) 1986-06-25

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